High-tech enterprise focusing on R&D, production and sales of ultra-high-purity refractory metal sputtering targets.
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成分(Composition):Cu 30-100 wt%;In 60-100%; Ga up to 30%
纯度(Purity):99.99%,
密度(Density):8.65g/cm³
晶粒尺寸(Grain size)<100um
表面光洁度(RMS):Ra0.8